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The structure and photo-response properties of ZnO:Fe/ITO thin film synthesized using  a pyrolysis method were studied in this work. ZnO:Fe/ITO thin film referred to as FZO/ITO was characterized using the X-ray diffraction (XRD) technique and current-voltage (I-V) measurements. The XRD analysis showed that the detected peaks at 30.23°, 35.15°, 37.36°, 45.18°, and 50.54° belonged to the ITO cubic phase. The I-V analyses showed that the sample had the saturation current, Schottky barrier, and sensitivity of 16.24 µA, 0.4771, and 0,90 µA respectively. The FZO/ITO gave a good response toward the light.





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Cara Mengutip
-, A. M., Lature, Y. K., Anrokhi, M. S., Friansa, K., Maharsi, R., & Nurfani, E. (2024). Structure and Photo-response Properties of FZO/ITO Thin Film. Newton-Maxwell Journal of Physics, 5(1), 28–31. https://doi.org/10.33369/nmj.v5i1.33178

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